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355nm Ultraviolet Laser

Characteristics:          应用领域:

点.pngUltra Low Noise           点.pngWafer Marking

点.pngHigh Power Stability    点.pngFully Cut Wafer Slicing

点.pngCompact                      点.png Low k dielectric slotting

点.pngControl Drive               点.pngMicro mechanical processing of silicon and sapphire

点.pngDigital Control

  • Introduction
  • Parameters

The long pulse width high-power 355nm ultraviolet laser launched by Maiwei Optoelectronics has a power output of 12W, and has the advantages of high power stability, compact structure, integrated control and driving, digital control, etc. It can be widely used in wafer marking, full cut wafer marking, low-K electrolyte slotting, micro mechanical processing of silicon, sapphire, ceramics, and metals.

Wavelength: 355nm


Parameters

Typical values

波长

Wavelength

                   355nm

功率输出

Output power

12W

脉冲能量

Pulse energy

>0.5mJ

光斑质量

Beam quality

M2< 1.3

功率稳定性

Power stability

Excellent long-term stability <2%@ 8 hours

脉冲宽度

Pulse width

~100ns long pulse width



PRF(kHZ)

Power(Watts)

Pulse Width(ns)

40

>=12

80+/-30

80

>=8

130+/-60

120

>=6

190+/-90

160

>=5

240+/-100

200

>=4.5

280+/-100

40

>=12

80+/-30



机械尺寸及安装(可定制)

 

Mechanical dimensions and installation (Customizable)

图片10.png 

 

 

 

 


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